Coming May 3-5 to the Charlotte Convention Center in Charlotte, NC, is e|5: UV and EB Technology Expo & Conference. It’s sponsored by RadTech Intl., the trade association for UV and eB technology. Formerly known as RadTech 2004, e|2004 continues the RadTech tradition of presenting the industry’s authoritative technical conference for ultraviolet and electron-beam curing technology.
At e|5 2004 there will be more than 100 papers presented, with sessions on chemistry, equipment, adhesives, measurement, analysis, graphic arts, photoinitiators, cationic chemistry, formulation, nanotechnology, raw materials, industrial applications, waterborne formulations, and the state of the international marketplace.
Also at the e|5 2004 will be a one-day educational session on May 4 covering the latest developments in UV technology for ink-jet and digital printers. This session is presented by RadTech International and the Digital Printing & Imaging Assn (DPI). It will include a panel discussion, hosted by Dan Marx of DPI, on the latest in UV ink-jet, with practical information on implementation, substrates, and applications.
On the e|5 show floor, the technology will be showcased with current and future applications for UV ink-jet and digital printing technology through a demonstration as well as display of products cured using UV technology.
For a complete list of all session descriptions and to register online, visit www.radtech.org.
